[PDF]    http://dx.doi.org/10.3952/lithjphys.44504

Open access article / Atviros prieigos straipsnis

Lith. J. Phys. 44, 353–358 (2004)


EFFECT OF MAGNETRON TARGET TEMPERATURE ON DEPOSITION RATE AND STRUCTURE OF Zr–ZrO2 THIN FILMS
J. Čyvienė, M. Laurikaitis, and J. Dudonis
Kaunas University of Technology, Studentų 50, LT-51368 Kaunas, Lithuania
E-mail: jurgita.cyviene@ktu.lt

Received 26 May 2004

Dedicated to the 100th anniversary of Professor K. Baršauskas

The influence of temperature of zirconium target on the process of reactive magnetron sputtering has been investigated in this work. Two processes have been studied: when the magnetron Zr target was not cooled in a common way, but thermally isolated from the magnetron cathode (“hot” target), and when the magnetron Zr target was cooled with water flow (“cold” target). First, current–voltage characteristics of Zr metal target were measured for the two cases when oxygen partial pressure is constant, and dependences of magnetron cathode voltage on partial pressure of oxygen, when magnetron discharge current is constant. Dependences of the film deposition rate on partial pressure of oxygen have also been measured. After complete analysis of the influence of the target temperature on this process of reactive magnetron sputtering, ZrO2 thin films were deposited on Si(111) substrates. The structure of films was investigated by XRD.
Keywords: reactive magnetron sputtering, zirconia
PACS: 81.15.Cd


MAGNETRONO KATODO TEMPERATŪROS ĮTAKA Zr–ZrO2 PLONŲ SLUOKSNIŲ NUSODINIMO SPARTAI IR JŲ SANDARAI
J. Čyvienė, M. Laurikaitis, J. Dudonis
Kauno technologijos universitetas, Kaunas, Lietuva

Tirtas reaktyvinis magnetroninis nusodinimas, esant įvairiai Zr katodo temperatūrai. Katodo temperatūra buvo keičiama nusodinant sluoksnius magnetronu, kurio katodas buvo tiesiogiai šaldomas vandeniu („šaltas“ katodas), arba naudojant šilumiškai izoliuotą katodą („karštas“ katodas). Pirmuoju atveju taikinio temperatūra siekė 30–50 °C, antru – 900–980 °C. Buvo išmatuotos magnetrono katodo (Zr) voltamperinės priklausomybės esant „šaltam“ ir „karštam“ katodui, kai deguonies dalinis slėgis pastovus, magnetrono katodo įtampos priklausomybės nuo deguonies dalinio slėgio, kai išlydžio srovės stipris pastovus, bei sluoksnių nusodinimo spartos priklausomybė nuo dalinio deguonies slėgio. Ištyrus magnetrono katodo temperatūros įtaką reaktyviniam nusodinimui, ZrO2 ploni sluoksniai buvo nusodinti ant Si(111) padėklų. Sluoksnių sandaros buvo ištirtos, remiantis Röntgen’o difrakcine analize.


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